Deposition Sources

Ion Sources (Filamentless)

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Our Ion Source systems include the ion source, power supply, cabling, feedthroughs, flexible internal utilities, swivel/rotating mounting collar, and choice of grids.

Our patented ion sources do not use thermionic tips nor filaments when generating plasma and neutralizing up to 85% of energy. These ion sources are offered in 3, 5, and 10 cm configurations.

Features:

3, 5, and 10 cm configurati
Filamentless sources
Reactive gas compatible
Internal or flange mount
Collimated or focused grids
UHV compatible

Applications include:

Ion-assisted deposition
Plasma cleaning
Oxiding
Nitriding
Surface modification

Specifications Table

Model	3 cm Source	5 cm Source	10 cm Source
Filaments	none	none	none
Process Gas	Argon (standard)	Argon (standard) Oxygen (optional)	Argon (standard) Oxygen (optional)
Ion Beam Currents	2 mA at 25 eV to 7 mA at 1000 eV	2 mA at 25 eV to 35 mA at 1200 eV	2 mA at 25 eV to 67 mA at 1200 eV
Ion Optics	Molybdenum collimated optics (standard) Divergent, convergent, and graphite ion optics (optional)	Molybdenum collimated optics (standard) Divergent, convergent, and graphite ion optics (optional)	Molybdenum collimated optics (standard) Divergent, convergent, and graphite ion optics (optional)
Ion Beam Uniformity	± 10% in the inner 75% of beam diameter	± 10% in the inner 75% of beam diameter	± 10% in the inner 75% of beam diameter
Remote Mount (standard)	8" min. CF Flange (optional)	8" min. CF Flange (optional)	10" min. CF Flange (optional)
Feedthrough	Dual 1" Gas and Elect. Feedthrough (standard) 2.75" CF Flanged Feedthrough (optional)	Dual 1" Gas and Elect. Feedthrough (standard) 2.75" CF Flanged Feedthrough (optional)	Dual 1" Gas and Elect. Feedthrough (standard) 2.75" CF Flanged Feedthrough (optional)
Source Material	300/400 Series SS High Purity High Temp. Fired Ceramic	300/400 Series SS High Purity High Temp. Fired Ceramic	300/400 Series SS High Purity High Temp. Fired Ceramic
Required Gas Flow	7 to 15 sccm to sustain the plasma	7 to 15 sccm to sustain the plasma	7 to 15 sccm to sustain the plasma
Operational Pressure (based on 2000 L/s effective pumping speed for N₂)	1.2x10^-4 to 4x10^-4 Torr	9x10^-5 to 2x10^-4 Torr	9x10^-5 to 2x10^-4 Torr
Nominal Pump Speed	1000 liters/sec	2000 liters/sec	2000 liters/sec
Emitter Power Supply (constant current controlled)	100 V to 475 V @ 0 to 225 mA	100 V to 475 V @ 0 to 225 mA	100 V to 525 V @ 0 to 225 mA
Anode Power Supply (constant voltage controlled)	0 to 1000 V @ 2 to 7 mA	0 to 1000 V @ 2 to 35 mA	0 to 1000 V @ 2 to 67 mA
Accelerator Power Supply (constant voltage controlled)	0 to 100 V @ 1 to 2 mA	0 to 100 V @ 1 to 2 mA	0 to 100 V @ 1 to 2 mA
Dimensions: Ion Source	3" dia. x 5.26" length	5.5" dia. x 7" length	6.1" dia. x 8.45" length
Dimensions: DC Switching Power Supply	19" rack mount (5.25" height x 18" depth)	19" rack mount (5.25" height x 18" depth)	19" rack mount (5.25" height x 18" depth)

Minimum ConFlat & ISO Flanges Dimensions

Minimum ConFlat Flange Dimensions	Minimum ISO Flange Dimensions
3 cm gun — 6-3/4" flange with 5" diameter tube 5 cm gun — 8" flange with 6" diameter tube 10 cm gun — 10" flange with 8" diameter tube	3 cm gun — ISO 160 5 cm gun — ISO 200 10 cm gun — ISO 250

Start Your Configuration

Standard Ion Configuration - Select from the configuration options to create a part number and price for a particular ion source package.
Example Configuration: I 3 L M A X R X 1

1. Ion Gun:
2. Gun Size:
3. Grid Selection:
4. Material:
5. Operating Primary Gas:
6. Four Gas Service:
7. Mounting Type:
8. Flange Type:
9. Power Supply Voltage:
Part Number:

Contact sales@lesker.com to discuss your specific vacuum application and process equipment needs.

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