Email to USA
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For applications requiring exceptional deposition rates we offer our RF inductive evaporator. This source is able to achieve deposition rates for Aluminum in excess of 120Å/sec. In order to further enhance throughput the source can be supplied with an integral ball feed assembly that allows uninterupted supply of fresh evaporation material.
For the deposition of aluminum the source can be held at idle temperature and using our specialized high throughput source material new material can be fed to a “hot” melt adding further throughput enhancement.
Dimensional Drawings
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Contact our Process Equipment Division to discuss your specific vacuum application and process equipment needs.
