TORUS®Circular R & D Magnetron Sputtering Cathode Clusters
Simultaneously depositing numerous materials is an important adjunct to thin film materials research and production. Clusters of three, four, or more TORUS sputter sources (cathodes) mounted on a single flange which converge at some distance from the target surfaces are ideal for these applications. Each individual sputter source retains its specification when mounted in a cluster arrangement. Our more sophisticated TORUS cluster sources have cross-contamination shields, intergal target gas injection ports, and individual source shutters. For applications requiring simultaneous depositions on large substrates, provisions should be made to the deposition system for substrate rotation to ensure uniform film thickness and composition.
We manufacture a wide variety of standard and customer specific cluster flange sources for sputter depostion. Please contact our Process Equipment Division to discuss your specific vacuum application and process equipment needs.
Figure 1 (Standard 3-TORUS Cathode Cluster Source)
Contact our Process Equipment Division to discuss your specific vacuum application and process equipment needs.