TORUS® Circular R&D Magnetron Sputtering Cathode Platforms
Our unique TORUS Platform is a complete sputtering package. The sputter source (cathode), shutter assembly, and integral gas injection are all combined on a rotatable 8" CF flange (other mounting flanges available). The TORUS sputter source is offset from center by 1.5 inches which allows for an eccentric rotation of the cathode. This cathode rotation allows the user to deposit uniform films by offsetting the source from a rotating substrate. The 8" CF flange is equipped with a VCR® port for use with the gas distrubution shroud to inject the process gas directly to the sputter target's surface. Through the use of compression fittings on both the sputter source and shutter assembly, the source-to-substrate distance is easily adjusted with up to 6 inches of variability.
TORUS Platforms feature
- Platform packages available for 1" - 4" circular TORUS sputter sources
- Axial or Flexible Head Assemblies
- RF, DC, or Pulsed-DC operation
- Adjustable source-to-substrate distance
- Pneumatic flip-style or swing-style UHV compatible shutter assemblies
- Standard 8" Rotatable CF Flange Mount (other mounting flanges available)
- Integral Gas Injection Port delivers process gas directly to target surface
Figure 1 (Flip Shutter Assembly)
Figure 2 (Swing Shutter Assembly)
Contact our Process Equipment Division to discuss your specific vacuum application and process equipment needs.