TORUS® Circular R&D Magnetron Sputtering Cathodes (UHV)
We offer a comprehensive line of circular TORUS magnetron sputter sources, in two and three inch diameters, suited for ultra high vacuum R&D applications. These sputter sources are "True UHV" cathodes, able to reach base pressures below 10-10 Torr due to their all-welded construction and 350°C bakeout temperature. Their unique high strength rare earth magnet arrays can be adjusted without breaking vacuum, allowing the user to sputter both magnetic and non-magnetic targets by altering the magnetic field over the target's surface -- thus optimizing the sputtering profile. Additionally, these sputter sources are equipped with an integral gas injection port for introducing the process gas directly to the target.
Contact our Process Equipment Division to discuss your specific vacuum application and process equipment needs.
TORUS UHV Sources feature
- Versatile RF, DC, and Pulsed-DC operation
- True UHV all-welded design (no elastomeric seals)
- Excellent film uniformity (3%) and target utilization (up to 30%)
- Integral gas injection port to introduce process gas at the target's surface
- Optional deposition chimneys and flip-style shutters reduce contamination during co-deposition
- High strength rare earth magnet arrays for sputtering magnetic and non-magentic materials
- Removeable magnet array is isolated from cooling water and bakeable to 350°C
TORUS Dimensions
All TORUS R&D circular sputter sources feature Type-N (male) power connectors, indirect water cooling, and balanced magnetic operation as standard. Unbalanced operation is available, please contact us for more information.
| Model | Mounting Flange |
Target Diam. in. (mm) |
Target |
Dimensions in. (mm)* | ||
|---|---|---|---|---|---|---|
| A | B | E | ||||
| TM2U | ||||||
| TM2U | ||||||
| TM3U | ||||||
| TM3U | ||||||
* Note: Dimensions involving flange-to-target thickness assume a standard target thickness of 1/8 inch. Add or subtract accordingly based on your particular sputter target size.
TORUS Configuration & Pricing Matrix
Select from the configuration options below to create a part number and price for the particular TORUS sputter source required.
Example Configuration: TM3US064GF is a 3 " OD source mounted on a 4" body (measured from flange to target surface) with a standard magnet array mounted to a 6 " CF flange with gas injection and pneumatic flip-style shutter. Example configuration options selected shown in red below.
| Style | PartNo Prefix | Base Price |
| TORUS Model/Size | ||
| For 2" OD Targets | TM2U | $4,695 |
| For 3" OD Targets | TM3U | $4,995 |
| Style | Option PartNo | Additional Price |
| Magnet Array | ||
| Standard | S | n/c |
| Magnetic Materials | M | $385 |
| Body Length * | ||
| 4" | 04 | n/c |
| Flange Size ** | ||
| 6" CF Flange | 6 | n/c |
| Gas Injection | ||
| Gas Injection Ring | G | $260 |
| Deposition Chimney | C | $245 |
| Both Gas Injection Ring and Chimney | B | $505 |
| (none) | X | n/c |
| Shutter | ||
| Pneumatic Actuation Flip-Style | F | $1,360 |
| Penumatic Actuation Swing-Style | S | $1,360 |
| (none) | X | n/c |
Contact our Process Equipment Division to discuss your specific vacuum application and process equipment needs.