Sign up for VacuCAD


Deposition Sources

Production Sputtering Sources

Click here to view production_sputtersource_2rec.jpg

(Click image to view in a new window)

 

Our TORUS® line of performance production magnetron sputter sources is a major breakthrough in the field of high-volume sputtering with target utilization up to 50%.

These sputter sources feature a unique combination of exceptional target life, high sputter rates, and increased power densities unmatched in the industry. The patented magnet designs trap electrons in inner, center, and outer erosion zones with precise magnetic field shapes to enable even erosion at maximum sputter target usage.

With circular production sources available from 6" to 12" diameter and linear sources available in lengths up to 140", KJLC® is positioned to offer the sputter solution for your production environment.

Features

Applications

Utilization by Target Size

Our production cathodes optimize sputter target utilization for a wide range of target sizes, geometries, and materials. The values represented in the utilization table were from using aluminum targets eroded at 9kW and 10-3 Torr using argon.

Target Size
(in.)
Utilization by wt.
(no backing plate)
kWhr Volume Used
(in3)
Groove Depth
(in.)
Linear Cathode Production Sources
2 x 38 x 1/4 28% 181 5.1 0.183
3-1/2 x 30 x 3/8 40% 558 15.7 0.250
5 x 12 x 1/2 38% 371 12.0 0.450
5 x 12 x 5/8 33% 409 15.0 0.525
5 x 36 x 1/2 37% 975 36.0 0.461
6 x 15 x 5/8 41% 793 23.0 0.575
6 x 46 x 5/8 40% 2,170 69.0 0.583
8 x 36 x 7/8 44% 3,361 111.0 0.763
11 x 45 x 1 43% 5,869 173.0 0.810
Circular Cathode Production Sources
6 x 1/2 37% 146 5.5 0.450
7 x 5/8 41% 346 10.0 0.555
7 x 3/4 41% 410 11.8 0.620
8 x 3/4 38% 495 14.1 0.583
8 x 7/8 41% 719 18.0 0.726
8 x 1 42% 870 20.2 0.820
12 x 7/8 45% 1,576 44.5 0.790

Contact our Process Equipment Division to discuss your specific vacuum application and process equipment needs.