Vacuum Systems

KJLC ALD Reactant Delivery System & Chamber Designs

Our front-port loading ALD reactor chamber is designed for maximum flexibility while our versatile reactant delivery systems (RDS) can handle high and low vapor pressure solid or liquid sources.

ALD Reactant Chamber Design

Our front-port loading ALD reactor chamber is designed for maximum flexibility. The substrate is loaded via a rectangular port in the chamber, either manually or with a sample loading tool, and positioned in the reactor where deposition occurs. Up to four precursor or gas inputs are introduced through the top plate; a fifth port is reserved for an optional remote plasma source for PEALD processes.

Features

• Low volume stainless steel construction
• Manual substrate loading port
• Substrates from small irregular pieces to 200mm (8") wafers
• Analytical ellipsometer ports in reactor chamber for in-situ analysis
• Top-plate mounted vapor delivery
• Curtain gas flow design prevents contamination on chamber walls and reduces unwanted side reactions
• Dry pumping options available

Available Options

• Vacuum load lock
• Remote plasma source
• Glove box
• RGA system
• Ellipsometry package
• Bubbler
• Substrate heating to 600°C
• Heated precursor lines
• Top-plate heating and exhaust

ALD Reactant Delivery System (RDS) Designs

Features Designed to cover a wide range of delivery requirements RDS available for solid, liquid, or vapor sources High and low vapor pressure source capabilities Various metering options, including mass flow controllers Bubblers available Computer-controlled heated delivery lines available
Example Gas Delivery Schematics
Gas delivery schematic (above) for ALD 380 shown with optional low vapor pressure reactant input   Gas delivery schematic (above) for ALD 1800 shown with multiple reactant and carrier gas inputs		Reactant delivery system for ALD 8000 shown with MFCs, valves, and gas lines (top bays) and pumping/LN2 trapping (bottom bays)

Process Control Software Overview

Our intuitive software is SEMI E95 compliant and features a wide range of process feedback information and user-input control.

Learn more about our software.

ALD System Platforms Overview

We offer stand-alone ALD systems for basic research or completely integrated deposition systems for complex R&D applications. All three of our ALD system platforms feature high speed ALD valves and integrated pumping, pressure measurement, and gas delivery packages optimized for your specific process.

Learn more about our ALD platforms.