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PVD Systems General Questionnaire

Application Information

1.	Industry: Application:
2.	Substrate Quantity: Substrate Material: Substrate Size(s):
3.	Your Substrate is: Substrate Bias:
4.	Substrate heating or cooling: Yes No If Yes, Temperature
5.	Substrate pre-clean:
6.	Substrate Load Lock: Glove Box Interface: Yes No
7.	Materials to be deposited: Film Thickness:
8.	Process: Magnetron Sputtering Thermal Evaporation E-beam Evaporation
9.	Film Thickness Monitor Film Thickness Controller
10.	No. of deposition sources required: Configured for co-deposition: Yes No
11.	Ion Assisted Deposition: Yes No
12.	Process gases to be used:
13.	Sputtering orientation: Up Down Off Axis Source-to-Substrate Distance (if known)
14.	If reactive sputtering, will a substrate process gas ring be required: Yes No
15.	Does your process involve lift-off: Yes No
16.	If sputtering: Power requirement:
17.	Other magnetron accessories: Flex Shutters Chimneys Gas Injection
18.	Process pressure: System base pressure:
19.	Performance requirements: Rate: Uniformity: Throughput:
20.	Do you have written specifications: Yes No If Yes, please specify:
21.	Level of system automation:
22.	Project Funded: Yes No Budgetary Only Delivery date required:
Comments

Contact Information

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Postal/ Zip Code:		^*Country:
Date:
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