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ALD-150L
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ALD Series—We offer stand-alone ALD systems for basic research or completely integrated deposition systems for complex R&D applications. All of our ALD system platforms feature full process control, integrated pumping, pressure measurement, and gas delivery packages optimized for your specific process.
Features
Compact computer controlled system features a high performance, efficient viscous flow ALD reactor.
- Small footprint
- Stainless steel chamber
- Accommodates 6" substrates
- Heating to 500°C
- Heated lines to 200°C
- Remote plasma option
- Load lock/substrate transfer option
- Bubbler option - with closed loop control
- Fully exhausted cabinet
Reactant Delivery System & Chamber Design Overview
Our front-port loading ALD reactor chamber is designed for maximum flexibility while our versatile reactant delivery systems (RDS) can handle high and low pressure solid or liquid sources.
Learn more about our RDS and reactor chamber designs.
Process Control Software Overview
Our intuitive software is SEMI E95 compliant and features a wide range of process feedback information and user-input control.
Learn more about our software.
