Vacuum Systems

KJLC Atomic Layer Deposition System Platforms

We offer stand-alone ALD systems for basic research or completely integrated deposition systems for complex R&D applications. All three of our ALD system platforms feature high speed ALD valves and integrated pumping, pressure measurement, and gas delivery packages optimized for your specific process.

Standard Platform Features

KJLC ALD 150L Series

Compact computer-controlled system features an efficient viscous flow ALD reactor chamber.

• Small footprint design maximizes clean room space
• Heated stainless steel chamber with front-port substrate loading
• Accommodates 6" diameter substrates
• Substrate heating to 500°C
• Gas/liquid/solid delivery for up to 8 or more reactant sources
• Heated precursor lines to 200°C
• Recipe driven process control software
• Options include: remote plasma; load lock; gas bubbler with closed loop control; and glove box

KJLC ALD 200L Series

Computer-controlled rack size system supports an intermediate level of ALD research.

• Viscous flow ALD reactor chamber
• Cabnit design allows for large number of reactant inputs
• Heated stainless steel chamber with front-port substrate loading
• Accommodates 8" diameter substrates
• Substrate heating up to 500°C
• Heated precursor lines to 200°C
• Fully exhausted cabinet with gas interlocks
• Recipe driven process control software
• Options include: remote plasma; load lock; gas bubbler with closed loop control; and glove box

 

KJLC ALD 8000 Series Robust computer-controlled multi-technique deposition system for advanced R&D. Central distribution center (CDC) connects ALD chamber to various process modules Manual or fully-automated robotic in-vacuum substrate transfer system Supported process modules include: magnetron sputtering (DC or RF); thermal evaporation of metals and organics; surface analysis; and others HV and UHV process chambers available for above techniques Viscous flow ALD reactor chamber Enclosed 2-bay or 3-bay ALD cabinet designs for maximum reactant and gas inputs Stainless steel ALD chamber with front-port substrate loading Accommodates 6" and 8" diameter substrates Substrate heating up to 500°C Heated precursor lines to 200°C Fully exhausted cabinet with gas interlocks Recipe driven process control software Options include: remote plasma; load lock; gas bubbler with closed loop control; and glove box
		Overall system with ALD module in foreground connected to CDC
		Reactant delivery system shown with MFCs, valves, and gas lines

Reactant Delivery System & Chamber Design Overview

Our front-port loading ALD reactor chamber is designed for maximum flexibility while our versatile reactant delivery systems (RDS) can handle high and low pressure solid or liquid sources.

Learn more about our RDS and reactor chamber designs.

Process Control Software Overview

Our intuitive software is SEMI E95 compliant and features a wide range of process feedback information and user-input control.

Learn more about our software.