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ALD Reactant Chamber Design

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The Kurt J. Lesker Company^®’s ALD reactant chamber is designed for fast cycle times and maximum flexibility. The sample is loaded through a rectangular port in the chamber (either manually or utilizing the optional load lock) and positioned in the reactant chamber where the deposition takes place. Up to four precursor or gas inputs are introduced through the top plate. A fifth input is available through the plasma port.

Features

• Stainless steel construction
• Front loading port
• Close proximity back side heating to 500°C
• Substrates from small irregular pieces up to 200mm wafers
• Analytical ports in reactor for in-situ analysis
• Remote plasma option for low temperature process
• Top mounted vapor delivery
• Curtain gas flow design to speed cycle time and to minimize contamination on reactor walls and ellipsometry to reduce unwanted side reactions

Optional

• Vacuum load lock
• Remote plasma source
• In-situ
• RGA system
• Ellipsometry package
• Bubbler
• 500°C substrate heating
• Chamber heating to 150°C
• Heated lines to 200°C
• Dry pumping remote with plasma source

Process Control Software Overview

Our intuitive software is SEMI E95 compliant and features a wide range of process feedback information and user-input control.

Learn more about our software.