CVD Deposition Systems

Our CVD complex oxide deposition systems are designed for the unique challenges researches face throughout the materials development lifecycle. Our CVD systems can be retrofitted with a variety of process options, enhancements, and precursor delivery systems.

Typical Applications

Cross sectional view of CVD reaction chamber with rotary disc reactors

Temperature controlled vapor delivery manifold features segmented zones

Pumping manifold features radial exhaust for uniform pumping

Complex oxide thin film materials research and pilot production
Ultra-thin film depositions

Deposition Techniques

CVD
ALD gas delivery
Plasma-enhanced CVD (PECVD)

Common Features & Options

Cylindrical 316L cold wall reaction chamber
High speed rotating disc reactors enhance depositions
Accommodates substrates up to 200mm
Radially-partitioned gas induction system features showerhead design for uniform gas flow
Advanced pumping manifold design enhances gas flow
Reactant delivery system (RDS) with flash evaporation chamber (see below for more information)
Fully automated computer process control
Full enclosure cabinet design

Process Options & Enhancements

Substrate heating and rotation
Inert gas glovebox
Robotic buffer and transfer chamber
Reactant, vapor, liquid, and solid precursor delivery
Atomic layer deposition (ALD) gas module
Plasma enhancement module with RF controller
In-situ and inline process monitoring
In-situ and inline metrology

Reactant Delivery System (RDS)

Designed to cover the wide spectrum of precursor delivery requirements

Precursor delivery systems for vapor, solid, or liquid sources
Flash evaporation chamber is ideal for complex oxides
Computer-controlled temperature control zones
High temperature, high conductance delivery manifolds
High vapor pressure to low vapor pressure capabilities
Various metering options
Available on our CVD systems or as a separate package to retrofit to your existing deposition system

Process Control Software

Open architecture allows for future expansion of control channels and boards

MS Windows-based PC process control software package
Automated process control and remote diagnostics
Extensible library of control applications
Open architecture allows for expansion

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