Welcome to the Kurt J. Lesker Company.  

Sign In | Register

Current Region: International (Change) | Contact Us |   RSS   Twitter   LinkedIn   YouTube

Close

Please select your country or region to be
directed to the appropriate Lesker site.

Thin Film Deposition Systems > PVD Systems (Physical Vapor Deposition Systems) > PVD System Series – Economical, Modular Design for Multiple Thin Film Deposition Applications

PVD (Physical Vapor Deposition) Thin Film System Series Overview

PVD Series—Modular design configured to suit a variety of thin film deposition applications, typically for research and development or small batch production.

Leading medical device manufacturers use our PVD line of systems to produce biocompatible films.

PVD75_comp_cntrl_1.jpg

Integrated computer control
shown on PVD-75 system

PVD_Panel_Inset.jpg

Manual touch screen control

PVD75_chmbr_intrnl.jpg

Close-up of D-shape chamber
with TORUS sputter sources

Typical Applications

  • R&D Thin Film Deposition
  • Small Batch Production

Deposition Techniques Available

  • Magnetron Sputtering (RF, DC, or Pulsed DC)
  • Electron Beam Evaporation
  • Thermal Evaporation
  • Organic Evaporation, Including OLED/PLED and Organic Electronics Applications

Process Options

  • Heating
  • Cooling
  • Bias
  • Ion Source for Substrate Cleaning/Assisted Deposition

Features

  • D-shape 304 stainless steel chamber
  • Aluminum door with large viewport
  • Turbomolecular or cryogenic pumping
  • Manual touch-screen or recipe-controlled PC based process automation
  • Single, multiple, or custom substrate fixtures

Optional

  • Planetary substrate fixture
  • Load lock

ISO:9001-2008 The Kurt J. Lesker Company is an ISO:9001-2008 certified company. Copyright ©1996-2014 Kurt J. Lesker Company® All rights reserved.