NANO 36™ – Affordable, Compact Sputtering or Thermal Evaporation Thin Film Deposition System

Features

• Adaptable chamber options
• Compact integrated design
• High speed diffusion pump(standard)
• Programmable Logic controller with touch screen interface
• Film thickness monitor, FTM-2400 or FTC-2800 controller

Multi-technique options

• 1"-4" Torus® circular magnetron sputtering sources

• This affordable, full feature system offers reliable PLC control with a color touch screen interface
• Single button commands and manual operation are accessed from the touch screen
• This offers a simple and convenient user interface with the NANO 36 Depostion System

Film thickness control

• Evaporation methods are controlled via a quartz crystal sensor in conjunction with a thin film controller
• The controller offers ease of use and reliability that is necessary to control the most demanding evaporation processes

Options

• Dry Roughing Pump or 300 l/s Turbo Pump
• Substrate rotation
• Heating to either 150°C or 350°

Chamber Options

• Chamber choices are either a simple 12" x 18" Pyrex Glass Bell Jar or a 16"x16" Stainless Steel Box Chamber
• The box chamber door opens wide for easy chamber access
• Maintenance of the chamber, source replenishment, and source change out can be performed in a matter of minutes

Flat plate substrate fixture

• Substrate options include primary rotation and heating up to 350°C with dual quartz lamp heaters
• The NANO 36 can accommodate up to an 8" diameter substrate mounting plate
• One single 8" wafer or multiple smaller wafers can be held in place
• The substrate plate can be easily removed or placed into the system with either a "lift up and out" hub mount or a twist-lock mounting