TORUS® Linear Magnetrons
- Architectural Glass
- Tool Coating
- Wear Coating
- Flat Panel Displays
- Web Coating
- Wear Coatings
Our TORUS® Linear magnetron line is designed as a universal tool for both R&D and Production applications. From its user friendly design features to its operational capabilities, it is sure to meet all of your application needs. Backed by over 60 years of experience and worldwide sales and support facilities, no matter where you are, you will receive the top quality sales and technical support you deserve.
Our linear magnetrons feature enhanced erosion and uniformity profiles as well as the most efficient target change procedure, making them one of the most efficient solutions in the industry. With standard, high strength, and unbalanced magnet options as well as custom configurations as needed, the TORUS® linear magnetrons provide options for all application requirements.
With a full range of sizes including standard widths of 3.5" and 5" and lengths up to 160", KJLC® is positioned to offer the sputter solution for your R&D or Production environment.
To request a quotation on one of our TORUS® Linear Magnetrons, please see the Linear Magnetron Questionnaire.
- Quick target change - drop-down anode walls
- High target utilization - 40% range
- Operating voltage drops as low as 15% for deposition process stability
- Standard, High Strength, and Unbalanced magnet options
- Field adjustable magnet design
- Standard sizes of 3.5" and 5" wide and up to 160" long
- Versatile RF, DC, or Pulsed-DC operation
- Internal or flange-mount configurations
- Custom designs available
- SAE or metric hardware
|Magnet Assembly||High strength, rare earth NdFeB (Neodymium Iron Boride)|
|Power Rating||DC: 100 watts/in2 (Indirect-Cooled), 250 watts/in2 (Direct Cooled)
RF: 1/3 DC power
|Operating Pressure||Typical range from 1-50 mTorr|
|Target Cross-Sections||Standard options: 3.5" and 5" (*Custom options available upon request)|
|Target Lengths||Lengths up to 4 meters|
|Target Utilization||Typical utilization in the 40% range (with Non-magnetic materials in a non-reactive mode)|
|Uniformity||Typical uniformity in the ±3%-5% range|
|Drop-Down Anode Walls||Quick and Easy target change - Anode shields do not need to be removed|
|Cooling||Direct and Indirect-Cooled target options|
|Worldwide Technical Support||Headquarters in USA, Canada, Europe and China|
|Warranty||All products covered by a 1-year warranty|
- Internal: Standard dual feedthrough design
(1 at each end)
- External: Flange mount configuration
- Angular Flex Stem
- Right Angle Stem
- Deposition Chimney
- Gas Ring
- High Strength Magnets
- Cluster Assemblies
- Optimized for up to 0.500" thick targets
High Strength (NdFeB)
- Optimized for up to 0.125" thick Ni targets
High Power Impulse Magnetron Sputtering (HiPIMS)
The Kurt J. Lesker Co™ / Starfire Industries HiPIMS IMPULSE™ supply is a versatile pulsed power module that converts a conventional DC sputtering system into a fully-functional High-Power Impulse Magnetron Sputtering (HiPIMS) system.
To learn more, view our IMPULSE - 2kW Pulsed Power Modules for Advanced Magnetron Sputtering page.