EpiCentre Deposition Stages:
The EpiCentre range of deposition stages employs cutting edge design and engineering to give high temperature substrate heating and manipulation under true UHV conditions. EpiCentres have been designed for deposition applications such as MBE (Molecular Beam Epitaxy), sputtering and CVD (Chemical Vapour Deposition). Substrate annealing, degassing and other high temperature material modifications can also be performed.
EpiCentres can be mounted in any orientation to suit customer chamber designs and application configurations.
The EpiCentre range has been used by pioneering research laboratories around the world for many years. End user references are available for a variety of applications and substrate sizes. The range comprises three model types: EC-I, EC-R and GLAD.
For a listing of Frequently Asked Questions (FAQs) about Manipulation & Motion please see this link: Manipulation & Motion FAQ.