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Thin Film Deposition Systems Series

Thin Film Deposition Systems Series Overview

The Kurt J. Lesker Company manufactures six different series of systems.

  • LAB Line – Process driven single-technique chamber provides maximum uniformity, and utilization.
  • PRO Line – Designed with a modular chamber that allows multiple techniques to be utilized within the same process chamber.
  • ALD – Technique that enables surface-controlled film growth on the atomic scale with excellent uniformity.
  • Glovebox Interfaced Systems – Chamber design with a large opening sliding front door and glovebox adapter.
  • Thin Film Deposition Cluster Tool Series – Allows users to incorporate up to 8 deposition modules positioned around a central wafer transfer hub.
  • Application Based Deposition Systems – Platforms that are specially engineered to meet a customer's requirements.

For more information please select your series below.

Having Trouble Finding A System? View the Thin Film Deposition Techniques & Capabilities page for a list of our various deposition techniques and what they involve. If you're having trouble deciding which system series is right for your application, please use our Thin Film Deposition Systems Guide to narrow down your search.


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