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Deposition System Shut Down & Storage

March 18, 2020 | By KJLC Blog

In these uncertain times, with many people needing to leave their labs for an extended period, it makes sense to review basic shut down procedures for thin film deposition systems. A comprehensive approach to system shutdown may reduce the number of issues related to the eventual re-start. At the Lesker Company we have a team of highly skilled engineers available to assist.

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Systems Vacuum Science



3D Deposition of Conformal Lead-Based Ferroelectric & Piezoelectric Thin Films by Atomic Layer Deposition

March 06, 2020 | By KJLC Innovate

Dr. Nicholas A. Strnad (General Technical Services, LLC) in collaboration with the U.S. Army Combat Capabilities Command Army Research Laboratory and the University of Maryland, College Park have recently developed conformal processes for a variety of lead-based electronic materials with outstanding properties using atomic layer deposition (ALD)...

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INNOVATE Systems Vacuum Science Deposition Techniques



The Effect of Sputter Cathode Design on Deposition Parameters: Design Enhancements Expand Capabilities for the Magnetron Sputtering of Thin Films

July 22, 2019 | By KJLC Innovate

Sputtering is a relatively mature approach for the deposition of a variety of thin film materials. Initial publications on the process date to the early 1800s. In its simplest form sputtering provides a route to manufacture high quality reflective coatings for mirrors and potato chip bags; and at the extreme end, for creating the most advanced semiconductor computing devices in the world.

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INNOVATE Systems Vacuum Science Deposition Techniques



A Positive Kick Enhances the High Power Impulse Magnetron Sputter Process

March 15, 2019 | By KJLC Innovate

High impulse power magnetron sputtering, either HIPIMS or HiPMS, was first reported in 1999 by Dr. Vladimir Kouznetsov, et al. from Linköping University’s Department of Physics. HIPIMS is distinct from classical direct current magnetron sputtering, or dcMS, because it utilizes a rapid series of pulses at very high voltage, on the order of 2000V, and high current density approaching 10A/cm2. In addition, HIPIMS also exhibits some degree of self-sputtering, where sputter target adatoms are ionized with some recycling of process gas and ionized target material to the surface of the target.

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INNOVATE Vacuum Science



Sources and Solutions for Contamination Issues in Space Simulation (TVAC) Systems

May 09, 2018 | By KJLC Innovate

The current push to commercialize space travel has resulted in renewed demand to launch objects and even people into earth orbit or event deep space. Companies including SpaceX, Blue Origin and Rocket Lab have demonstrated the ability to make certain portions of a launch vehicle reusable and that may dramatically alter the cost to get to space. True rocket ship factories are emerging which, in one case, can put out a couple of full blown launch vehicles every month!

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INNOVATE Systems Vacuum Science Deposition Techniques



Further Studies of Spoke Evolution in Sputter Plasmas Using a Linear Magnetron in DC and HIPIMS Modes

April 11, 2018 | By KJLC Innovate

Researchers Dr. André Anders and Dr. Yuchen Yang have expanded on their previous imaging work on linear magnetron cathodes. In their most recent work, titled “Plasma studies of a linear magnetron operating in the range from DC to HIPIMS,” the authors put forth additional information on the evolution and movement of spokes with several deposition materials and discharge conditions.

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INNOVATE Vacuum Science



KJLC® Awarded a Patent for its Atomic Layer Deposition System and Process

November 28, 2017 | By KJLC Innovate

The Kurt J. Lesker Company® (KJLC®), a global manufacturer of vacuum systems, thin film deposition tools and vacuum components, today announced that the United States Patent and Trademark Office has issued US patent number 9,695,510, 'Atomic Layer Deposition Apparatus and Process', covering the design of an atomic layer deposition system and the process to use that system to deposit highly precise and conformal thin films. This proprietary technology substantially reduces the interaction of various precursor gas molecules with the internal surfaces of the reaction chamber and enables actual focusing of gas streams to more effectively coat the surface of arbitrarily large substrates.

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INNOVATE Systems Vacuum Science Deposition Techniques



KJLC Featured at the 70th Annual Gaseous Electronics Conference

November 28, 2017 | By KJLC Blog

On 6 November 2017 our Jason Hrebik and J.R. Gaines delivered presentations at the 70th annual conference on Gaseous Electronics (GEC2017), held at the Doubletree Hotel, Green Tree, PA. Hrebik displayed his expertise through a presentation on the capabilities and benefits of the High Power Impulse Sputtering (HiPIMs) process and provided the audience with an introduction to the new KJLC Impulse™ power supply. The conference featured a group of presentations from industrial companies, including LAM Research, Applied Materials, and Tokyo Electron. Gaines capped off the afternoon session with a review of the practical issues associated with the integration and application of plasmas in Plasma-Enhanced Atomic Layer Deposition (PEALD).

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Vacuum Science Deposition Techniques



Fresh Insights on the Flow of Electrons by Direct Observation of Spoke Evolution in Magnetron Sputtering

October 25, 2017 | By KJLC Innovate

In a July 2017 publication, Drs. André Anders and Yuchen Yang provide an enhanced description of the flows and energy of electrons at the face of a magnetron sputter cathode. By combining a unique imaging process and a linear cathode (target) the researchers were able to generate a series of time/space images which shows plasma instabilities driven by the motion of electrons, within the cathode's magnetic field. The images show the effects on plasma flow for both conventional DC magnetron sputtering (dcMS) and also high power impulse magnetron sputtering (HiPIMs). The full paper is available on line at http://aip.scitation.org/doi/10.1063/1.4994192.

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INNOVATE Vacuum Science Deposition Techniques



Industry Leading Water Cooling

May 15, 2017 | By KJLC Blog

With the dramatic growth expected in many industries which require high temperature vacuum systems such as space simulation systems, 3D printing of metal components, the manufacture of single crystals for the LED and semiconductors and others, alternatives to traditional water cooling approaches may offer performance gains coupled with reduced costs. Temperature control for these applications can take several forms. In the case of space simulation, the vacuum system is designed to duplicate the temperature (and pressure) extremes that will be experienced by satellites in earth orbit, or beyond, which may require rapid cycling from -130°C to +130°C. For crystal growing, using methods such as the Kyropoulos process, where a crystal is 'pulled' from a melt of material, such as silicon, the internal temperature of a vacuum system may reach +1,450°C. In one case, the temperature control system for the vacuum chamber is designed to provide a user-specified profile of cold-to-hot and in another the system is required to safely mitigate and protect the system from the extreme temperature required to liquify silicon.

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Vacuum Science



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