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Equivalent Oxide Thickness (EOT) Scaling with Hafnium Zirconium Oxide High-K Dielectric from a Surprising Boost in Permittivity

June 01, 2020 | By KJLC Innovate

Dr. Kai Ni from the research group of Professor Suman Datta, Stinson Professor of Nanotechnology at the University of Notre Dame, in collaboration with Purdue University and Kurt J. Lesker Company recently developed conformal atomic layer deposition (ALD) based hafnium zirconium oxide thin film processes displaying excellent electrical properties for potential gate oxide complement or replacement in scaled logic and memory technology nodes. The findings were recently published and showcased in the IEEE International Electron Devices Meeting (IEDM) 2019 in San Francisco, CA [ref. 1]. In particular, hafnium zirconium oxide (HfxZr1-xO2, or HZO) has emerged as a ferroelectric (large charge density per unit area) material system that also displays a tunable permittivity or dielectric constant (charge response) depending on the concentration of Zr added to the base HfO2 oxide. The reported films indicate that by sweeping the concentration of Zr in HfO2 during the ALD growth, a substantial boost in the dielectric constant can be observed around 70% Zr concentration due to the presence of a crystallographic phase transition of the underlying HZO material structure, which results in enhanced electrical performance even in ultrathin films 25Å thick [ref. 2]. These findings elucidate the necessity and importance of extremely stringent deposition process control along with corresponding electrical and structural characterization for the understanding of new materials systems for their further implementation in commercial applications such as high-performance digital and analog CMOS technology at advanced nodes.

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INNOVATE Systems Vacuum Science Deposition Techniques



Durability of Automotive Exhaust Systems Enhanced by Heat Treatment in High Vacuum

May 01, 2020 | By KJLC Blog

In a recently issued patent (US 10,619,950 April 14, 2020) researchers at the Toyota Motor Company have demonstrated that the corrosion resistance of stainless steel exhaust systems for cars and trucks can be substantially improved by heat treatment in high vacuum. Stainless steel is a complex metal alloy of iron, nickel, chrome and other elements. It is known to be a very durable metal but even this robust material can be corroded by exposure to chloride ions, sulfuric and hydrochloric acids, soot and other artifacts of the exhaust from an internal combustion engine. Reaction with these aggressive gases causes pits in steel which eventually lead to premature failure. The use of low-grade fuels speeds the degradation of exhaust systems.

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INNOVATE Systems Vacuum Science Deposition Techniques



Deposition System Shut Down & Storage

March 18, 2020 | By KJLC Blog

In these uncertain times, with many people needing to leave their labs for an extended period, it makes sense to review basic shut down procedures for thin film deposition systems. A comprehensive approach to system shutdown may reduce the number of issues related to the eventual re-start. At the Lesker Company we have a team of highly skilled engineers available to assist.

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Systems Vacuum Science



3D Deposition of Conformal Lead-Based Ferroelectric & Piezoelectric Thin Films by Atomic Layer Deposition

March 06, 2020 | By KJLC Innovate

Dr. Nicholas A. Strnad (General Technical Services, LLC) in collaboration with the U.S. Army Combat Capabilities Command Army Research Laboratory and the University of Maryland, College Park have recently developed conformal processes for a variety of lead-based electronic materials with outstanding properties using atomic layer deposition (ALD)...

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INNOVATE Systems Vacuum Science Deposition Techniques



The Effect of Sputter Cathode Design on Deposition Parameters: Design Enhancements Expand Capabilities for the Magnetron Sputtering of Thin Films

July 22, 2019 | By KJLC Innovate

Sputtering is a relatively mature approach for the deposition of a variety of thin film materials. Initial publications on the process date to the early 1800s. In its simplest form sputtering provides a route to manufacture high quality reflective coatings for mirrors and potato chip bags; and at the extreme end, for creating the most advanced semiconductor computing devices in the world.

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INNOVATE Systems Vacuum Science Deposition Techniques



Sources and Solutions for Contamination Issues in Space Simulation (TVAC) Systems

May 09, 2018 | By KJLC Innovate

The current push to commercialize space travel has resulted in renewed demand to launch objects and even people into earth orbit or event deep space. Companies including SpaceX, Blue Origin and Rocket Lab have demonstrated the ability to make certain portions of a launch vehicle reusable and that may dramatically alter the cost to get to space. True rocket ship factories are emerging which, in one case, can put out a couple of full blown launch vehicles every month!

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INNOVATE Systems Vacuum Science Deposition Techniques



KJLC® Awarded a Patent for its Atomic Layer Deposition System and Process

November 28, 2017 | By KJLC Innovate

The Kurt J. Lesker Company® (KJLC®), a global manufacturer of vacuum systems, thin film deposition tools and vacuum components, today announced that the United States Patent and Trademark Office has issued US patent number 9,695,510, 'Atomic Layer Deposition Apparatus and Process', covering the design of an atomic layer deposition system and the process to use that system to deposit highly precise and conformal thin films. This proprietary technology substantially reduces the interaction of various precursor gas molecules with the internal surfaces of the reaction chamber and enables actual focusing of gas streams to more effectively coat the surface of arbitrarily large substrates.

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INNOVATE Systems Vacuum Science Deposition Techniques



Novel Deposition System Designs for Thin Film Materials Research

February 20, 2017 | By KJLC Innovate

Next generation vacuum deposition systems must evolve in order to keep pace with the ongoing evolution of thin film materials and devices. Researchers seeking to pursue new areas, such as biomedical devices, 2D materials, specialized magnetics and oxide-based films need new tools to support their work. The frontiers of materials science, particularly at the intersection of biology and thin film deposition, have brought new materials into the vacuum space that were never intended to be there.

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INNOVATE Systems Vacuum Science Deposition Techniques



System for Sputtering Uniform Optical Coatings on Flat and Curved Surfaces without Masks

November 23, 2016 | By KJLC Innovate

Many optical coating applications require excellent uniformity in both the physical thickness and optical properties of the deposited films. As interest grows in sophisticated coatings on challenging substrate shapes, such as aspheres, high performance eyewear, beveled cell phone screens, camera lenses and a variety of other products, meeting these uniformity requirements becomes more difficult.

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INNOVATE Systems Vacuum Science Deposition Techniques



High Power Impulse Magnetron Sputtering (HIPIMS)

August 30, 2016 | By KJLC Innovate

High Power Pulsed Magnetron Sputtering (HPPMS) or High Power Impulse Magnetron Sputtering (HIPIMS) is a type of magnetron sputtering technique where high power pulses of hundreds of microseconds are applied to the magnetron target at frequencies ranging from a few Hz to several kHz.

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INNOVATE Systems Vacuum Science



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