Welcome to the Kurt J. Lesker Company.  

Sign In | Register

Current Region: International (Change) | Contact Us |   RSS   Twitter   LinkedIn   YouTube   Instagram


Please select your country or region to be
directed to the appropriate Lesker site.


The Effect of Sputter Cathode Design on Deposition Parameters: Design Enhancements Expand Capabilities for the Magnetron Sputtering of Thin Films

July 22, 2019 |

Sputtering is a relatively mature approach for the deposition of a variety of thin film materials. Initial publications on the process date to the early 1800s. In its simplest form sputtering provides a route to manufacture high quality reflective coatings for mirrors and potato chip bags; and at the extreme end, for creating the most advanced semiconductor computing devices in the world.

Read More

Tags: Default | Deposition Techniques | INNOVATE | Systems | Vacuum Science

A Positive Kick Enhances the High Power Impulse Magnetron Sputter Process

January 18, 2019 | No Comments

High impulse power magnetron sputtering, either HIPIMS or HiPMS, was first reported in 1999 by Dr. Vladimir Kouznetsov, et al. from Linköping University’s Department of Physics. HIPIMS is distinct from classical direct current magnetron sputtering, or dcMS, because it utilizes a rapid series of pulses at very high voltage, on the order of 2000V, and high current density approaching 10A/cm2. In addition, HIPIMS also exhibits some degree of self-sputtering, where sputter target adatoms are ionized with some recycling of process gas and ionized target material to the surface of the target.

Read More

No CommentsTags: INNOVATE | Vacuum Science

Further Studies of Spoke Evolution in Sputter Plasmas Using a Linear Magnetron in DC and HIPIMS Modes

April 11, 2018 |

Researchers Dr. André Anders and Dr. Yuchen Yang have expanded on their previous imaging work on linear magnetron cathodes. In their most recent work, titled “Plasma studies of a linear magnetron operating in the range from DC to HIPIMS,” the authors put forth additional information on the evolution and movement of spokes with several deposition materials and discharge conditions.

Read More

Tags: INNOVATE | Vacuum Science

Sources and Solutions for Contamination Issues in Space Simulation (TVAC) Systems

March 23, 2018 |

The current push to commercialize space travel has resulted in renewed demand to launch objects and even people into earth orbit or event deep space. Companies including SpaceX, Blue Origin and Rocket Lab have demonstrated the ability to make certain portions of a launch vehicle reusable and that may dramatically alter the cost to get to space. True rocket ship factories are emerging which, in one case, can put out a couple of full blown launch vehicles every month!

Read More

Tags: Default | Deposition Techniques | INNOVATE | Systems | Vacuum Science

KJLC® Awarded a Patent for its Atomic Layer Deposition System and Process

November 28, 2017 |

The Kurt J. Lesker Company® (KJLC®), a global manufacturer of vacuum systems, thin film deposition tools and vacuum components, today announced that the United States Patent and Trademark Office has issued US patent number 9,695,510, 'Atomic Layer Deposition Apparatus and Process', covering the design of an atomic layer deposition system and the process to use that system to deposit highly precise and conformal thin films. This proprietary technology substantially reduces the interaction of various precursor gas molecules with the internal surfaces of the reaction chamber and enables actual focusing of gas streams to more effectively coat the surface of arbitrarily large substrates.

Read More

Tags: Default | Deposition Techniques | INNOVATE | Systems | Vacuum Science

KJLC Featured at the 70th Annual Gaseous Electronics Conference

November 28, 2017 |

On 6 November 2017 our Jason Hrebik and J.R. Gaines delivered presentations at the 70th annual conference on Gaseous Electronics (GEC2017), held at the Doubletree Hotel, Green Tree, PA. Hrebik displayed his expertise through a presentation on the capabilities and benefits of the High Power Impulse Sputtering (HiPIMs) process and provided the audience with an introduction to the new KJLC Impulse™ power supply. The conference featured a group of presentations from industrial companies, including LAM Research, Applied Materials, and Tokyo Electron. Gaines capped off the afternoon session with a review of the practical issues associated with the integration and application of plasmas in Plasma-Enhanced Atomic Layer Deposition (PEALD).

Read More

Tags: Default | Deposition Techniques | Vacuum Science

Fresh Insights on the Flow of Electrons by Direct Observation of Spoke Evolution in Magnetron Sputtering

October 25, 2017 |

In a July 2017 publication, Drs. André Anders and Yuchen Yang provide an enhanced description of the flows and energy of electrons at the face of a magnetron sputter cathode. By combining a unique imaging process and a linear cathode (target) the researchers were able to generate a series of time/space images which shows plasma instabilities driven by the motion of electrons, within the cathode's magnetic field. The images show the effects on plasma flow for both conventional DC magnetron sputtering (dcMS) and also high power impulse magnetron sputtering (HiPIMs). The full paper is available on line at http://aip.scitation.org/doi/10.1063/1.4994192.

Read More

Tags: Default | Deposition Techniques | INNOVATE | Vacuum Science

Industry Leading Water Cooling

May 15, 2017 |

With the dramatic growth expected in many industries which require high temperature vacuum systems such as space simulation systems, 3D printing of metal components, the manufacture of single crystals for the LED and semiconductors and others, alternatives to traditional water cooling approaches may offer performance gains coupled with reduced costs. Temperature control for these applications can take several forms. In the case of space simulation, the vacuum system is designed to duplicate the temperature (and pressure) extremes that will be experienced by satellites in earth orbit, or beyond, which may require rapid cycling from -130°C to +130°C. For crystal growing, using methods such as the Kyropoulos process, where a crystal is 'pulled' from a melt of material, such as silicon, the internal temperature of a vacuum system may reach +1,450°C. In one case, the temperature control system for the vacuum chamber is designed to provide a user-specified profile of cold-to-hot and in another the system is required to safely mitigate and protect the system from the extreme temperature required to liquify silicon.

Read More

Tags: Default | Vacuum Science

Novel Deposition System Designs for Thin Film Materials Research

January 25, 2017 |

Next generation vacuum deposition systems must evolve in order to keep pace with the ongoing evolution of thin film materials and devices. Researchers seeking to pursue new areas, such as biomedical devices, 2D materials, specialized magnetics and oxide-based films need new tools to support their work. The frontiers of materials science, particularly at the intersection of biology and thin film deposition, have brought new materials into the vacuum space that were never intended to be there.

Read More

Tags: Default | Deposition Techniques | INNOVATE | Systems | Vacuum Science

Introducing KJLC 704-T Diffusion Pump Oil For Harsh Environments

December 30, 2016 |

Users of diffusion pumps for harsh processes or in non-optimized vacuum systems may be seeing crystallization of solids in their pump fluid. This crystallization results from decomposition of fluids due to over exposure to oxygen at high temperatures. This break down alters the viscosity of the pump fluid and may also obstruct flow passages. Further, the build-up of solids and crystals on internal surfaces can lead to inefficient heat transfer which may make operation of the pump unstable.

Read More

Tags: Default | Vacuum Fluids & Greases | Vacuum Science