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System for Sputtering Uniform Optical Coatings on Flat and Curved Surfaces without Masks

November 23, 2016 |

Many optical coating applications require excellent uniformity in both the physical thickness and optical properties of the deposited films. As interest grows in sophisticated coatings on challenging substrate shapes, such as aspheres, high performance eyewear, beveled cell phone screens, camera lenses and a variety of other products, meeting these uniformity requirements becomes more difficult.

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Tags: Default | Deposition Techniques | INNOVATE | Systems | Vacuum Science



Vacuum-Enabled Thin Film Deposition Advances Energy Storage Technologies

July 20, 2016 |

The concept of energy storage in thin films has been around for a long time. One of the early uses of the term 'Thin Film Battery' (TFB) was in a 1976 patent by Exxon [1]. Nearly 20 years later, Bates and his team at Oak Ridge National Laboratory (ORNL) patented the sputter-based, all solid state battery utilizing the electrolyte LiPON [2]. The Bates battery paired LiCoO2 and Li3PO4-xNx (LiPON) to produce a 4 volt secondary cell.

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Tags: Default | Deposition Techniques | INNOVATE | Systems | Vacuum Science



KJLC Expands Material Information

June 28, 2016 |

"Enabling technology for a better world" is Kurt J Lesker Company’s mission. It’s what our employees come to work thinking about each day. In keeping with this goal, we strive to provide technical advice and share our experiences with our customers. We are continually adding useful technical information to our product pages, including appropriate crucibles/crucible liners for many of our materials. Z-ratios, vapor pressures, maximum power recommendations, and densities are available on the majority of our evaporation material and sputtering target web pages.

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Tags: Default | Deposition Materials



Challenges for Non-Ideal Atomic Layer Deposition Processes & Systems

May 09, 2016 |

ALD has been described as a thin film deposition technology that can keep the semiconductor industry on track per Moore's law (or observation) [1] for a few more years. In its most ideal form, it is a process that enables monolayer, or sub-monolayer growth of certain materials through the sequential exposure of a functionalized substrate to a pair of precursor gases. If dosed correctly the gases attach at specific surface sites and react to create a near perfect film on the order of a few angstroms thick. Presently the U.S. Department of Defense anticipates that the last process node for semiconductor devices (the end of Moore's) is 7 nm and will be achieved by 2020 [2].

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Tags: Default | Deposition Techniques | INNOVATE | Systems | Vacuum Science



High Precision Optical Coatings Deposited by Cylindrical Magnetron Sputtering

February 02, 2016 |

The Kurt J. Lesker Company® (KJLC®) is introducing a novel optical coating system incorporating the Isoflux Inverted Cylindrical Magnetron (ICM) with a unique substrate carrier configuration designed to provide features unavailable in any currently marketed coating system. The combination of the Isoflux ICM with the design of the KJLC precision optical coating system results in a deposition tool capable of providing high quality coatings with unprecedented flexibility of operation, all in a package with an unrivaled simplicity of design and operation.

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Tags: Default | Deposition Techniques | INNOVATE | Systems | Vacuum Science