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Entries Tagged as Deposition Techniques

The Effect of Sputter Cathode Design on Deposition Parameters: Design Enhancements Expand Capabilities for the Magnetron Sputtering of Thin Films

July 22, 2019 |

Sputtering is a relatively mature approach for the deposition of a variety of thin film materials. Initial publications on the process date to the early 1800s. In its simplest form sputtering provides a route to manufacture high quality reflective coatings for mirrors and potato chip bags; and at the extreme end, for creating the most advanced semiconductor computing devices in the world.

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Tags: Default | Deposition Techniques | INNOVATE | Systems | Vacuum Science



Sources and Solutions for Contamination Issues in Space Simulation (TVAC) Systems

March 23, 2018 |

The current push to commercialize space travel has resulted in renewed demand to launch objects and even people into earth orbit or event deep space. Companies including SpaceX, Blue Origin and Rocket Lab have demonstrated the ability to make certain portions of a launch vehicle reusable and that may dramatically alter the cost to get to space. True rocket ship factories are emerging which, in one case, can put out a couple of full blown launch vehicles every month!

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Tags: Default | Deposition Techniques | INNOVATE | Systems | Vacuum Science



KJLC® Awarded a Patent for its Atomic Layer Deposition System and Process

November 28, 2017 |

The Kurt J. Lesker Company® (KJLC®), a global manufacturer of vacuum systems, thin film deposition tools and vacuum components, today announced that the United States Patent and Trademark Office has issued US patent number 9,695,510, 'Atomic Layer Deposition Apparatus and Process', covering the design of an atomic layer deposition system and the process to use that system to deposit highly precise and conformal thin films. This proprietary technology substantially reduces the interaction of various precursor gas molecules with the internal surfaces of the reaction chamber and enables actual focusing of gas streams to more effectively coat the surface of arbitrarily large substrates.

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Tags: Default | Deposition Techniques | INNOVATE | Systems | Vacuum Science



KJLC Featured at the 70th Annual Gaseous Electronics Conference

November 28, 2017 |

On 6 November 2017 our Jason Hrebik and J.R. Gaines delivered presentations at the 70th annual conference on Gaseous Electronics (GEC2017), held at the Doubletree Hotel, Green Tree, PA. Hrebik displayed his expertise through a presentation on the capabilities and benefits of the High Power Impulse Sputtering (HiPIMs) process and provided the audience with an introduction to the new KJLC Impulse™ power supply. The conference featured a group of presentations from industrial companies, including LAM Research, Applied Materials, and Tokyo Electron. Gaines capped off the afternoon session with a review of the practical issues associated with the integration and application of plasmas in Plasma-Enhanced Atomic Layer Deposition (PEALD).

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Tags: Default | Deposition Techniques | Vacuum Science



Fresh Insights on the Flow of Electrons by Direct Observation of Spoke Evolution in Magnetron Sputtering

October 25, 2017 |

In a July 2017 publication, Drs. André Anders and Yuchen Yang provide an enhanced description of the flows and energy of electrons at the face of a magnetron sputter cathode. By combining a unique imaging process and a linear cathode (target) the researchers were able to generate a series of time/space images which shows plasma instabilities driven by the motion of electrons, within the cathode's magnetic field. The images show the effects on plasma flow for both conventional DC magnetron sputtering (dcMS) and also high power impulse magnetron sputtering (HiPIMs). The full paper is available on line at http://aip.scitation.org/doi/10.1063/1.4994192.

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Tags: Default | Deposition Techniques | INNOVATE | Vacuum Science



Novel Deposition System Designs for Thin Film Materials Research

January 25, 2017 |

Next generation vacuum deposition systems must evolve in order to keep pace with the ongoing evolution of thin film materials and devices. Researchers seeking to pursue new areas, such as biomedical devices, 2D materials, specialized magnetics and oxide-based films need new tools to support their work. The frontiers of materials science, particularly at the intersection of biology and thin film deposition, have brought new materials into the vacuum space that were never intended to be there.

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Tags: Default | Deposition Techniques | INNOVATE | Systems | Vacuum Science



System for Sputtering Uniform Optical Coatings on Flat and Curved Surfaces without Masks

November 23, 2016 |

Many optical coating applications require excellent uniformity in both the physical thickness and optical properties of the deposited films. As interest grows in sophisticated coatings on challenging substrate shapes, such as aspheres, high performance eyewear, beveled cell phone screens, camera lenses and a variety of other products, meeting these uniformity requirements becomes more difficult.

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Tags: Default | Deposition Techniques | INNOVATE | Systems | Vacuum Science



Vacuum-Enabled Thin Film Deposition Advances Energy Storage Technologies

July 20, 2016 |

The concept of energy storage in thin films has been around for a long time. One of the early uses of the term 'Thin Film Battery' (TFB) was in a 1976 patent by Exxon [1]. Nearly 20 years later, Bates and his team at Oak Ridge National Laboratory (ORNL) patented the sputter-based, all solid state battery utilizing the electrolyte LiPON [2]. The Bates battery paired LiCoO2 and Li3PO4-xNx (LiPON) to produce a 4 volt secondary cell.

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Tags: Default | Deposition Techniques | INNOVATE | Systems | Vacuum Science



Challenges for Non-Ideal Atomic Layer Deposition Processes & Systems

May 09, 2016 |

ALD has been described as a thin film deposition technology that can keep the semiconductor industry on track per Moore's law (or observation) [1] for a few more years. In its most ideal form, it is a process that enables monolayer, or sub-monolayer growth of certain materials through the sequential exposure of a functionalized substrate to a pair of precursor gases. If dosed correctly the gases attach at specific surface sites and react to create a near perfect film on the order of a few angstroms thick. Presently the U.S. Department of Defense anticipates that the last process node for semiconductor devices (the end of Moore's) is 7 nm and will be achieved by 2020 [2].

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Tags: Default | Deposition Techniques | INNOVATE | Systems | Vacuum Science



High Precision Optical Coatings Deposited by Cylindrical Magnetron Sputtering

February 02, 2016 |

The Kurt J. Lesker Company® (KJLC®) is introducing a novel optical coating system incorporating the Isoflux Inverted Cylindrical Magnetron (ICM) with a unique substrate carrier configuration designed to provide features unavailable in any currently marketed coating system. The combination of the Isoflux ICM with the design of the KJLC precision optical coating system results in a deposition tool capable of providing high quality coatings with unprecedented flexibility of operation, all in a package with an unrivaled simplicity of design and operation.

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Tags: Default | Deposition Techniques | INNOVATE | Systems | Vacuum Science