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Silicon Dioxide SiO2 Notes


Silicon Dioxide (SiO2) General Information

Silicon dioxide, also known as silica, has a chemical formula of SiO2. It has a melting point of 1,610°C, a density of 2.648 g/cc, and a vapor pressure of 10-4 Torr at 1,025°C. Silicon dioxide is commonly found in nature as sand or quartz. It is primarily used in the production of glass for windows and beverage bottles. It is evaporated under vacuum for the fabrication of optoelectronic and circuit devices.

Silicon Dioxide SiO2 Specifications

Material TypeSilicon (IV) Oxide
SymbolSiO2
Color/AppearanceWhite, Crystalline Solid
Melting Point (°C)1,610
Theoretical Density (g/cc)~2.65
SputterRF
Max Power Density
(Watts/Square Inch)
30*
Type of BondIndium, Elastomer
Z Ratio**1.00
E-BeamExcellent
Thermal Evaporation Techniques Crucible:  Al2O3
E-Beam Crucible Liner MaterialFABMATE®, Graphite, Tantalum
Temp. (°C) for Given Vap. Press. (Torr) 10-8:  *
10-6:  *
10-4:  1,025*
CommentsQuartz excellent in E-beam.

* Influenced by composition.

** The z-ratio is unknown. Therefore, we recommend using 1.00 or an experimentally determined value. Please click here for instructions on how to determine this value.

* This is a recommendation based on our experience running these materials in KJLC guns. The ratings are based on unbonded targets and are material specific. Bonded targets should be run at lower powers to prevent bonding failures. Bonded targets should be run at 20 Watts/Square Inch or lower, depending on the material.

Z-Factors

Empirical Determination of Z-Factor

Unfortunately, Z Factor and Shear Modulus are not readily available for many materials. In this case, the Z-Factor can also be determined empirically using the following method:

  • Deposit material until Crystal Life is near 50%, or near the end of life, whichever is sooner.
  • Place a new substrate adjacent to the used quartz sensor.
  • Set QCM Density to the calibrated value; Tooling to 100%
  • Zero thickness
  • Deposit approximately 1000 to 5000 A of material on the substrate.
  • Use a profilometer or interferometer to measure the actual substrate film thickness.
  • Adjust the Z Factor of the instrument until the correct thickness reading is shown.

Another alternative is to change crystals frequently and ignore the error. The graph below shows the % Error in Rate/Thickness from using the wrong Z Factor. For a crystal with 90% life, the error is negligible for even large errors in the programmed versus actual Z Factor.