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Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets

Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets Overview

Our comprehensive offering of sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website. Below you will find budgetary pricing for sputtering targets and deposition materials per your requirements. Actual prices may vary due to market fluctuations. To speak to someone directly about current pricing or for a quote on sputtering targets and other deposition products not listed, please click here.


Empirical Determination of Z-Factor

Unfortunately, Z Factor and Shear Modulus are not readily available for many materials. In this case, the Z-Factor can also be determined empirically using the following method:

  • Deposit material until Crystal Life is near 50%, or near the end of life, whichever is sooner.
  • Place a new substrate adjacent to the used quartz sensor.
  • Set QCM Density to the calibrated value; Tooling to 100%
  • Zero thickness
  • Deposit approximately 1000 to 5000 A of material on the substrate.
  • Use a profilometer or interferometer to measure the actual substrate film thickness.
  • Adjust the Z Factor of the instrument until the correct thickness reading is shown.

Another alternative is to change crystals frequently and ignore the error. The graph below shows the % Error in Rate/Thickness from using the wrong Z Factor. For a crystal with 90% life, the error is negligible for even large errors in the programmed versus actual Z Factor.

  • Bonding is recommended for these materials. Many materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity. Request more information, please click here.
  • This material may require special ramp up and ramp down procedures. This process may not be necessary with other materials. Targets that have a low thermal conductivity are susceptible to thermal shock. Please click here for Ramp Procedure for Ceramic Target Break-in.

Click here for the Lanthanum Nickel Oxide SDS.
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Deposition Materials FAQ
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Ordering Table

Material Description Size Purity Compatible Guns Notes Part Number Price In Stock Add To Cart
Material Description Size Purity Compatible Guns Notes Part Number Price In Stock Add To Cart
Lanthanum Nickel Oxide DNU - LANTHANUM NICKEL OXIDE TARGET, LaNiO3, 99.9% PURE, 1.00" DIAMETER X 0.125" THICK, +/-0.010" ALL, MIXED PHASES MAY BE PRESENT 1.00" Dia. x 0.125" Thick 99.9% Most Standard Guns 1 Limited availability and specially priced. EJTLANIO1A2 P.O.R. Contact KJLC for Availability

Dimensions vary by sputtering gun. Review sputtering gun manual to determine appropriate target size.
Limited availability and specially priced.

Contact Us - Lanthanum Nickel Oxide LaNiO3 Sputtering Targets