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Film Sense FS-1 Ellipsometer

Affordable Multi-Wavelength Ellipsometer for Thin Film Measurements

The FS-1 Multi-Wavelength Ellipsometer excels at measuring the thickness and index of refraction of transparent single films, in the thickness range from 0 to 1000 nm (0 - 1 micron).

The FS-1 can characterize many technologically important thin films from a wide range of industries:

  • Semiconductor industry: silicon oxide and nitrides, high and low k dielectrics, amorphous and polycrystalline silicon films, photo-resists
  • Optical Coatings industry: high and low index films such as SiO2, TiO2, Ta2O5, MgF2, etc.
  • Display industry: TCO's (such as ITO), amorphous silicon films, organic films (for OLED technology)
  • Data Storage industry: diamond like carbon (DLC) films
  • Process R&D: in situ characterization of film deposition (rate and optical constants) vs. process conditions, applicable to MBE, MOCVD, ALD, Sputtering, etc.
  • Chemistry and Biology: detection of sub-monolayer material adsorption in liquid cell experiments
  • Industrial: in-line monitoring and control of film thickness


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