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TORUS® Circular Magnetron Sputtering Source Clusters

Co-deposition of materials is an important adjunct to thin film materials research and production. Clusters of multiple TORUS sputter sources (cathodes) mounted on a single flange are ideal for these applications.

TORUS cluster sources are available with optional cross-contamination shields, integral target gas injection ports, individual source shutters, and a variety of flange mounting options.

For applications requiring simultaneous depositions on large substrates, provisions should be made to the deposition system for substrate rotation to ensure uniform film thickness and alloy composition, or during non-rotating depositions a planned compositional gradient can be created.

NOTE: LTE and HTE Clusters sources are also available. Please contact us for more information.

Dimensional Drawings

Magnetron Sputtering
Cathode Services
To learn more about how we service you and your TORUS® sputter sources, click here.
Magnetron Performance
Optimization Guide
To learn more about sputtering rates and uniformity, click here.
Contact Us
To speak with someone directly, please call +1 412 387 9200 or email

Start Your Configuration

1. Series:
2. Gun Size:
3. Cluster Designation:
4. Source Quantity:
5. Flange Spots:
6. Magnet Configuration:
7. Mounting:
8. Tube Length:
9. Gas/Chimney:
10. Shutter:
11. Flange Size: