Classic Deposition Systems

CMS (Combinatorial Materials Science) Series – Advanced Research System utilizing Sputtering or Electron Beam Techniques

• The CMS platform is a versatile thin film deposition system for advanced materials research and development.
• Configurable with six or more magnetron sputtering sources.
• Available Linear multi-pocket UHV electron beam evaporation source (multi-technique options available).
• Oil Sealed or dry rough pumping, cryogenic or magnetically-levitated turbo high vacuum pumping options available.
• Compatible with up to 8" OD substrates, custom configurations available.
• Substrate Heating to 1100°C, cooling, and biasing options also available.
• Single or multi-wafer load lock option available.
• Computer system control with recipe and data logging options available.

AXXIS – Co-Sputtering, Thermal Evaporation, & Electron Beam Techniques

• The AXXIS platform incorporates radial deposition ports and a right-angled tilting substrate stage to efficiently facilitate multiple deposition techniques.
• Substrate stage allows precise angled resolution for applications, such as Glancing Angle Deposition.
• Up to 6 HV magnetron sputtering sources, multi-pocket electron beam evaporation source, up to 3 thermal evaporation sources (multi-technique options available).
• Wet or dry rough pumping, turbo, magnetically-levitated turbo or cryogenic pump high vacuum pumping options available.
• Standard configurations compatible with up to 8" OD substrates; custom configurations available, up to 550°C heating, cooling, and glow discharge options available.
• Single or multi-wafer load lock option available.
• Basic computer system control with recipe and data logging options available.

PVD-DRUM

• The PVD-DRUM platform combines a drum fixture with linear cathodes to provide a high throughput, high uniformity system.
• The vertical, cylindrical drum houses multiple wafers that are rotated through the linear cathodes deposition plume.
• Linear cathodes provide a very uniform coating over a large area to provide a typical deposition uniformity of better than +/-5%.
• These system utilize the standard PVD 75, PVD 200 and PVD 500 platform chambers and components.
• Custom configurations are available.

Please contact us for more info: +1 412 387 9200 | international@lesker.com

Pulsed Filtered Cathodic Arc

• System tools utilizing the innovative Pulsed Filtered Cathodic Arc Source technology.
• Highly efficient for hard coatings and diamond like carbon coatings.
• Arc systems allow a high level of film property control, such as tuning the films compressive stress.
• Arc systems operate at a lower pressure than traditional sputtering tools.
• These system utilize the standard PVD 75, PVD 200 and PVD 500 platform chambers and components.

Please contact us for more info: +1 412 387 9200 | international@lesker.com