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EpiCentre Stage Questionnaire

2. Stage Orientation

Vertical - Substrate facing up

Vertical - Substrate facing down

Other (Non-standard option, please specify below)

Glancing Angle Deposition required: Yes No

3. EC-I Mounting Flange Required

10" OD CF

12" OD CF

14" OD CF

16.5" OD CF

Other (Non-standard option, please specify below)

4. EC-I Substrate Size

100mm

150mm

200mm

Other (Non-standard option, please specify below)

Substrate will be:

Bare Wafer

In A Holder

EpiCentre Configuration & Options

EC-I Configuration

Note: Standard EC-I configuration selected - click options to select an alternative.

5. Substrate Biasing

None

DC/RF biasing (option)

6. Substrate Rotation

Stepper Motor

24V DC Motor (option)

Smart Motor (option)

No Motor (option)

7. Substrate Rotation Speed

20rpm (recommended)

Other - please specify

rpm

8. Rotation Controller

None

Supplied (option)

9. Cradle lift/lower to aid sample transfer

25mm pneumatic

Manual hand wheel (option)

10. Cradle Home Sensor

None supplied

Fitted (option)

11. How will samples be transferred?

Manually at atmoshpere

Transfer arm under vacuum

12. Deposition height adjustment

None

50mm (option)

100mm (option)

150mm (option)

Actuation:

None Manual Motorized

13. Substrate shutter

None

Manual shutter (option)

Motorised shutter (option)

Pneumatic shutter (option)

14. Heater Shields

Molybdenum shields

Inconel shields (option)

15. Deposition Cans

None

Supplied (option)

16. Thermocouple

None required

Type K

Type C

Quantity required

None One Two

2. EC-R Mounting Flange

8" OD CF

10" OD CF

12" OD CF

Other (Non-standard option, please specify below)

3. EC-R Substrate Size

100mm

200mm

Other (Non-standard option, please specify below)

Substrate will be:

Bare Wafer

In A Holder

EpiCentre Configuration & Options

EC-R Configuration

Note: Standard EC-R configuration selected - click options to select an alternative.

4. Polar (Primary) Rotation

Manual

Stepper Motor (option)

No Motor (option)

5. Substrate Biasing

None

DC/RF biasing (option)

6. Substrate (Azimuthal) Rotation

None

Stepper Motor (option)

24V DC Motor (option)

Manual (option)

No Motor (option)

7. Substrate Rotation Speed
(if substrate rotation option selcted)

20rpm (recommended)

Other - please specify

rpm

8. Rotation Controller

None

Supplied (option)

9. Rotation Home Sensor

None supplied

Fitted (option)

10. How will samples be transferred?

Manually at atmoshpere

Transfer arm under vacuum

11. Z-Shift Adjustment

None

Specify below (option)

12. XY Motion

None

Required (option)

Actuation:

None Manual Motorized

13. Thermocouple

None required

Type K

Type C

Does the intended process involve the use of high partial pressures of O₂?

Silicon Carbide coated Graphite (SiCg) heater element

No – Select SiCg heater element

Standard heating element. Not recommended for oxidising atmospheres as the heating element will degrade over time.

Solid Silicon Carbide (sSiC) heater element

Yes / Don't Know – Select sSiC heater element

Heating element option. Recommended for use in oxidising atmospheres.

Are any of the following materials incompatible with your process?
(please tick all that apply)

None

Tantalum

Copper

Molybdenum

Aluminium

Stainless Steel

Inconel

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What is the application?
What substrate materials will you be using?
What is the process chamber's ultimate (base) pressure requirement?
What maximum temperature and pressure do you wish to heat the substrate to in vacuum?
How long do you need to maintain this temperature?

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Country:	State:	Returning KJLC customer?:

	Gas	Partial Pressure (mbar or torr)	Temperature	Duration
1.
2.
3.
4.
5.
6.

EpiCentre Stage Questionnaire

EpiCentre Series Selection

1. Which series do you prefer?

EC-I In-line Design

EC-R Right-angled Design

2. Stage Orientation

3. EC-I Mounting Flange Required

4. EC-I Substrate Size

EpiCentre Configuration & Options

EC-I Configuration

5. Substrate Biasing

6. Substrate Rotation

7. Substrate Rotation Speed

8. Rotation Controller

9. Cradle lift/lower to aid sample transfer

10. Cradle Home Sensor

11. How will samples be transferred?

12. Deposition height adjustment

13. Substrate shutter

14. Heater Shields

15. Deposition Cans

16. Thermocouple

2. EC-R Mounting Flange

3. EC-R Substrate Size

EpiCentre Configuration & Options

EC-R Configuration

4. Polar (Primary) Rotation

5. Substrate Biasing

6. Substrate (Azimuthal) Rotation

7. Substrate Rotation Speed(if substrate rotation option selcted)

8. Rotation Controller

9. Rotation Home Sensor

10. How will samples be transferred?

11. Z-Shift Adjustment

12. XY Motion

13. Thermocouple

EpiCentre Heater Selection (required for both EC-I and EC-R series)

Does the intended process involve the use of high partial pressures of O2?

Silicon Carbide coated Graphite (SiCg) heater element

Solid Silicon Carbide (sSiC) heater element

Temperature controller & power supply?

Application Details (required for both EC-I and EC-R series)

What is the application?

What substrate materials will you be using?

What is the process chamber's ultimate (base) pressure requirement?

What maximum temperature and pressure do you wish to heat the substrate to in vacuum?

How long do you need to maintain this temperature?

If gases or vapours are involved in your process please complete the information below:

Gas

Partial Pressure(mbar or torr)

Temperature

Duration

Are any of the following materials incompatible with your process?(please tick all that apply)

Additional Comments

Related Products

Would you like more information on our range of sample transfer products including:

7. Substrate Rotation Speed
(if substrate rotation option selcted)

Does the intended process involve the use of high partial pressures of O₂?

Partial Pressure
(mbar or torr)

Are any of the following materials incompatible with your process?
(please tick all that apply)