Thin Film Deposition System Platform
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PRO Line PVD 200 – Versatile Sputtering, Electron Beam, & Thermal Evaporation Deposition Platform
Techniques Offered:
- Electron Beam Evaporation
- Thermal Evaporation
- Magnetron Sputtering
- Low Temperature Evaporation sources
- Multiple Techniques
Overview
The Kurt J. Lesker Company® PRO Line PVD 200 is a modular, full featured thin film deposition system allowing 8" wafer transfer, up to 8 sputter cathodes and eKLipse advanced control software. With more than 500 units in service worldwide, the PVD series is a proven, robust, and versatile design consisting of the PVD 75 and 200 platforms. The PRO Line PVD 200 builds on the successes of the original design with improved system base pressures and pump down times. A technically superior chamber design, an industry best software control system with advanced programming capability, automatic substrate loading, and numerous features for optimized thin film performance are a few of the key advantages offered in this innovative, best of class design.
The PRO Line PVD 200 is compatible with the following techniques:
- Thermal Evaporation (up to six 4" individual boats)
- Torus® Magnetron Sputtering sources (up to eight 2" or 3" sources)
- Electron Beam Evaporation Source (4 pocket 8cc, 8 pocket 12cc, 6 pocket 20cc)
- LTE10 Organic deposition sources (up to two)
- Combinations of the above techniques are also available.
- Custom configurations are available upon request
KJLC's software allows user friendly recipe creation along with a reliable, uninterruptable processing module that allows process completion, regardless of the state of the computer user interface. For more information on this intuitive, unique, and reliable software package, please see the Software Tab.
Features
Modular Process Chamber
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Vacuum Pumping & Gauging
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SafetyFully enclosed system electronics rack.
*System dimensions and mounting dependent on options selected. |
QualityUtilizing industry leading components allows KJLC to produce the highest quality PVD R&D tool on the market. Components and key manufacturing points are:
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Pumping Options
HV Pumping Options
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Upstream Pressure Control
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Process Equipment Options
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Magnetron Sputtering Source Power Supplies
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Torus® Magnetron Sputtering Source (Up to eight)
For more information on our new Mag Keeper sources please see the following link. |
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Electron Beam Evaporation Source |
Thermal Evaporation Source
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Substrate Options
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Standard Substrate Fixtures
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Single Substrate Load Lock
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Pumping:The PRO Line PVD 200 offers four types of high vacuum pumping on its process chamber, a Pfeiffer 790 L/s turbomolecular pump (standard), as well as an optional 1250L/s Pfeiffer turbomolecular pump, Brooks CTI-8F 1500 L/s, or 3000 L/s cryo pump. The Pfeiffer turbomolecular pumps being a good choice for overall cost effective high quality pumping particularly for sputtering applications. The Brook CTI cryo pumps find use in applications that require the lowest vacuum possible, particularly for thermal evaporation and electron beam applications. The chart to the right demonstrates average expected pumping performance by pump type for an outfitted PRO Line PVD 200 process chamber that is clean and dry with (5) Torus 3" Mag-keeper sources installed and a 3' long 1.5" metal flex bellows roughing line. |
Pump data for a clean dry and empty PRO Line PVD 200. Pumping performance is depending on chamber conditions and components installed. |
Deposition:The PRO Line PVD 200 is one of Kurt J. Lesker's most versatile thin film deposition systems offering single and multi-technique deposition options including thermal evaporation, magnetron sputtering (Torus), and electron beam. Only KJLC offers Mag-Keeper sputter sources with zero o-rings in the cathode body and a magnetically coupled target to allow for easy target changes. Our "patent pending" cooling well design enables operation at power densities up to 200 watts/.in2. This cathode is designed to sputter up to a 0.375" thick targets. Without a hold down clamp or dark space shield this cathode is capable of running as low as ≤ 1mTorr (material dependent). The unique dome shutter design eliminates the need for additional cross contamination shielding required with standard flip or swing shutters. To learn more about sputtering rates and uniformity, click here. |
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KJLC E-beam sources are also designed to eliminate unnecessary o-rings, seals, and feedthroughs to lower pumpdown times and provide excellent base pressures. Only three feedthrough's are required for the KJLC E-beam source and there is no dynamic water to vacuum o-ring seal in this design which greatly reduces the risk of a water leak in the vacuum chamber. |
Typical Deposition Uniformities |
The PRO Line PVD 200 has been designed for optimal uniformities and allows ultimate base pressures otherwise not achievable in modular R&D systems until now. The chart to the left shows average expected uniformity by deposition type and substrate wafer diameter. Thickness measurements were made using a Profilometer or spectral reflectometer. The actual uniformity achievable will be a function of the final configuration of the system and process parameters. |

Architecture Overview
Recipes
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Custom Chart Recorder and Datalogging
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Remote Support Utility and Apps
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Media Gallery
Photo Gallery
Downloads & Documents
View information on major components regarding your product.
Datasheets & Component Lists
Frames:Pumping:Sources:Power Supplies: |
Contact Global Process Equipment Service and Support for assistance with KJLC Systems by clicking here .
Helpful Material Resources
Materials Overview
Our Materials Division stocks a vast assortment of high purity materials, evaporation sources, and crucible liners for use in both thermal and E-beam evaporation as well as sputter deposition processes. We offer pure elements, compounds, alloys, ceramics, intermetallics, and mixtures in a variety of shapes, sizes, and purities for both R&D and Production applications. Each sputtering target and evaporation material ships complete with a Certificate of Analysis and SDS. We also provide in-house sputter target bonding and precious metals reclamation services, saving you both time and money.
Sputter Targets
We manufacture a wide range of target materials designed to meet the demanding needs of both Production customers as well R&D customers needing a custom one off target. We are able to offer various purities, materials, sizes, and compositions. Our experienced in house bonding team is also able to provide high quality bonding services using KJLC or customer supplied backing plates. Many standard sizes and configurations available to ship directly from stock.
Evaporation Materials
KJLC stocks a wide variety of evaporation materials in various sizes, shapes and quantities, available for immediate shipment. The range of materials offered is extensive, including pure metals, precious metals, standard alloys, oxides, nitrides, and fluorides. The materials can be packaged for the small quantity user, as well as, for the large volume production customer.
Precious Metals
Our unique offering of precious metal products protects our customers from daily market price fluctuations by locking in the price on the day the order is placed. Inventory management tools allow us to stock a variety of precious metal products in standard target configurations, as well as, pellet, shot, and wire for evaporation. Shipments are packaged per order in the quantities our customers require, allowing them to purchase as much or as little as they need. Because of the high value of these materials we offer a convenient reclaim service for precious metal scrap. Credit is applied quickly to customer accounts which can be used to fund their next purchase. Kurt J. Lesker Company understands that these high cost materials require tight controls and close management. Our goal is to make precious metal purchases as easy as possible for our customers.
Thermal Sources
As a complement to the extensive offering of evaporation materials, a wide range of thermal evaporation sources are available to our customers. Hundreds of boat sources with differing geometries and capacities make it easy to find a source that is ideally suited to coat numerous materials onto substrates of various configurations. Many materials prove troublesome for evaporation and may require a different style of evaporation source. In addition to boat sources, alternative sources such as filaments, baskets, box heaters, and heaters with crucibles may be the solution to evaporating these more difficult materials. A wide range of products are available to ship from stock with evaporation materials or as replacements.
Ceramic Materials Manufacturing
The Kurt J. Lesker Company continues to expand process capabilities in ceramic manufacturing to meet the evolving requirements for these demanding products. In-house powder synthesis capabilities, utilizing various chemical techniques, give us the ability to manufacture custom stoichiometries for both R&D and production material requirements. Proprietary mixing and sintering methods yield homogeneous, high density products ideally suited for PVD applications. Hot pressing is also utilized to enhance the variety of ceramics that can be offered.
Quality
At the Kurt J. Lesker Company quality is our highest priority. Our ISO 9001 certification ensures that product quality is never compromised. All of our products undergo the requisite level of quality control inspection and all materials are shipped with a certificate of analysis and material safety data sheet. We employ numerous analytical techniques at various stages in the process to ensure that the products meet our quality standards and perform in the demanding applications which they are used.
Technical Support
As a leading manufacturer of PVD equipment, we have quite a few technical resources within the organization. We are happy to help troubleshoot or offer advice on process related questions ranging from sputtering powers to crucible selection.
Would You Like More Information?
Do you have any questions? Click below to get in contact with one of our many experienced team members.
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