The Okinawa Institute of Science and Technology (OIST), located in Okinawa, Japan, is known for its interdisciplinary approach to research and its investment in advanced scientific infrastructure. From nanofabrication to materials characterization, OIST's core facilities are designed to support researchers as they push the boundaries of discovery.
Recently, OIST highlighted the installation of a Kurt J. Lesker Company PRO Line PVD75 sputter deposition system within its Engineering and nanofabrication ecosystem. Installed in a cleanroom environment, the system expands OIST's thin‑film deposition capabilities while aligning with the facility's emphasis on precision, flexibility, and shared access to advanced instrumentation.
Research Infrastructure Built to Scale
OIST's Engineering Section supports a wide range of experimental work, including nanofabrication and microfabrication conducted inside Class 1000 cleanrooms. Tools selected for these environments must perform reliably across multiple research groups while supporting diverse materials, processes, and experimental objectives.
The PRO Line PVD75 system installed at OIST reflects this balance between capability and usability. The system is configured with four 2" magnetron sputter targets, supporting materials such as Al, Ti, Cr, ITO, Si3N4, SiO2, Nb, with additional targets available as research needs evolve. This flexibility allows researchers to explore metallization, optical coatings, and functional thin films on a single platform.
PRO Line PVD75: Technical Capabilities Supporting Advanced Thin‑Film Research
The PVD75 system provides a combination of ultra‑high‑vacuum performance and process flexibility well suited for advanced research applications:
Base pressure: typically 8x10-8 Torr, enabling reduced contamination from residual gases such as water vapor and hydrocarbons, which can directly impact thin‑film defect density Substrate handling: supports samples from small pieces up to 6" (150 mm) diameter substrates, with ±5% thickness homogeneity up to 4" Substrate heating: up to 350°C, with rotation up to 20 RPM for improved film uniformity Power configurations: DC and RF power supply options, enabling deposition of both conductive metals and dielectric materials RF substrate bias: available for oxide and nitride depositions as well as in‑situ sample cleaning Process modes: supports reactive sputtering, making the system suitable for optical layers, passivation coatings, and functional thin filmsTogether, these capabilities allow researchers to tailor deposition conditions for a wide range of thin‑film materials while maintaining the low‑contamination environment required for high‑quality films.
KJLC's Role: Enabling, Not Limiting, Research
At the Kurt J. Lesker Company, our role is to enable researchers by delivering tools that integrate seamlessly into complex research facilities. The PRO Line PVD75 installed at OIST is designed to support exploratory research while remaining robust enough for shared, high‑use environments.
In research settings where multiple users depend on the same system, vacuum performance, process repeatability, and serviceability are just as critical as raw technical capability. By pairing near‑UHV base pressures with flexible process configurations, the PVD75 supports OIST's model of interdisciplinary collaboration and long‑term scientific growth.
Supporting Global Research Communities
OIST's approach emphasizes shared access, user training, and cross‑disciplinary collaboration. Equipment selected for these environments must deliver consistent performance across a wide range of users and applications.
KJLC is proud to support institutions like OIST by providing deposition systems that fit into broader research ecosystems with tools that help maintain momentum as research programs expand and evolve.
Learn More
To see how the Kurt J. Lesker PRO Line PVD75 fits into OIST's Engineering and nanofabrication capabilities, visit OIST's equipment page: Sputter Deposition System | Okinawa Institute of Science and Technology (OIST)