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Application Specific Systems

PURPOSE-BUILT FOR PIONEERING RESEARCH

Precision thin-film deposition platforms engineered around the demands of today's most advanced applications. From quantum computing and superconducting devices to next-generation photovoltaics and 3D flip-chip interconnects.

Choose Your Application Series

Quanta Series

Quanta Series

Superconducting & Quantum Computing Devices

Ultra-high vacuum thin-film deposition platforms engineered for Josephson junctions, superconducting circuits, and low-loss interconnects. Covers e-beam evaporated aluminum JJs, UHV sputtering of superconducting metals and reactive compounds, and high-rate indium bump bonding for 3D integration. All systems are compatible with UHV transfer solutions for next-generation quantum device fabrication.

KIDs/TES E-Beam, Sputter, & ALD SQUIDs Josephson Junctions UHV Transfer
Perovskite Series

Perovskite Series

Solar Cells & Next-Gen Photovoltaics

An advanced thin-film deposition platform engineered for substrates up to 210mm x 210mm, extending the SPECTROS architecture with a chamber optimized for vacuum-based perovskite deposition. Features enhanced pump protection, cooling shrouds, and up to 16 low-temperature evaporation sources (50–600°C) to handle volatile precursors. Supports glovebox integration, co-deposition, load lock, and ALD for barrier layers.

ALD Barrier Co-Deposition Glovebox Integration LTE Sources 210 x 210mm Substrates
Indium Series

Indium Series

Flip-Chip Bump Bonding & 3D Integration

Purpose-built for indium bump bonding on wafers up to 200mm, delivering deposition rates exceeding 100 Å/sec with films up to 20 µm thick. LN2-cooled substrates promote high aspect-ratio out-of-plane growth essential for robust flip-chip interconnects in superconducting quantum circuits. Up to four high-capacity thermal sources, specialized shielding, and flux monitoring enable up to 10 wafers per pump cycle.

Ion Source 20µm Thick Films LN2 Substrate Cooling >100 Å/sec Rate 200mm Wafers
TSV/TGV Series

TSV/TGV Series

Through Silicon Via & Through Glass Via Metallization

Purpose-built for depositing adhesion, barrier, and seed layers into high-aspect-ratio (up to 8:1) Through Silicon Vias and Through Glass Vias. A technically superior chamber design paired with KJLC's TORUS MagKeeper FFE sputter sources and HiPIMS ionization delivers excellent step coverage and uniformity deep inside complex via structures. The eKLipse™ software control system enables stable, high-rate deposition, allowing up to 10 wafers to be processed before breaking vacuum. Available as single-chamber systems or fully integrated cluster tools with robotic transfer, pre-clean, and dedicated barrier/seed modules.

Cluster Tool Configurations Ti/TiN/TaN/Cu Processes Ion Source Pre-Clean eKLipse Automation FFE MagKeeper Sources 8:1 Aspect Ratio HiPIMS & HiPIMS Bias
Space Simulation Series

Space Simulation Series

Thermal Vacuum Chambers for Aerospace Testing

Scalable Thermal Vacuum Chamber (TVAC) platforms engineered to replicate the deep vacuum and extreme thermal conditions of outer space. Systems range from compact CubeSat-scale chambers to large cylindrical enclosures for full satellite assemblies, achieving pressures from 10-6 to 10-8 Torr. Programmable thermal cycling from -100°C (LN2) to +250°C, optional solar/radiation simulation, and full eKLipse-driven recipe automation support qualification, validation, and life-cycle testing of aerospace hardware.

eKLipse Automation CubeSat to Spacecraft Solar Simulation -100°C to +250°C 10-8 Torr Vacuum

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